Product Overview
We utilize advanced chemical vapor deposition (CVD) technology to synthesize high-quality graphene directly on copper foil substrates. Our process employs copper’s excellent surface catalytic properties to enable controlled graphene growth through self-limiting mechanisms, ensuring uniform large-area coverage ideal for both research and industrial applications.
Specifications
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Substrate Material: High-purity copper foil (~25μm thickness)
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Graphene Area: 15cm × 10cm
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Layer Options: Single, Double, 3-5, 6-8 layers
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Pretreatment Note: For Raman testing, specify preferred method (front-side PMMA coating or back-etching)
Key Features
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High Crystallinity: Excellent purity with uniform crystal structure
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Superior Electrical Properties: High carrier mobility and low resistivity
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Good Transparency: Maintains high visible light transmittance
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Mechanical Flexibility: Withstands bending and handling stress
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Chemical Stability: Stable performance at room temperature
Applications
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Electronic devices (transistors, capacitors)
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Transparent conductive films and touch screens
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Chemical and biological sensors
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Solar cells and supercapacitors
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Composite material enhancement
Technical Support
Our team provides:
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Customized pretreatment options
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Transfer methodology guidance
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Application-specific consulting
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Comprehensive technical documentation
Contact Information
For product details and technical consultation:
Email: Sales@maxnanotech.com




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