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CVDGraphene film on quartz substrate(Circular base)

Price range: $291.67 through $354.17

Single to 8-layer graphene transferred onto 3mm fused quartz. Excellent transparency, thermal stability, and electrical performance. Ideal for optical devices, sensors, electrodes, and high-temperature applications.

  • Substrate: 3mm fused quartz

  • Graphene area: 1cm × 1cm

  • Quality: Raman verified on SiO₂

Email: sales@maxnanotech.com

Important Notes

  •  No Refunds or Exchanges: All sales are final. MAXNANO does not provide return, exchange, or refund services under any circumstances.
  • Customs and Import Obligations: Clearance procedures, import duties, taxes, and related costs are solely the responsibility of the recipient/importer. MAXNANO shall not be held liable for delays, rejections, or any additional expenses incurred during customs processes. Such issues shall not constitute grounds for order cancellation or refund.
  • Order Cancellation: Orders cannot be revoked once submitted. No refunds will be issued for cancelled or undelivered orders.
  • Indemnification: The purchaser agrees to bear all claims, losses, legal liabilities, and expenses arising from the use of products and services, and shall hold MAXNANO, its affiliates, and personnel harmless from such obligations.
  • Terms and Conditions: All orders and business interactions are subject to MAXNANO’s standard Terms and Agreements.

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Product Overview
We produce high-quality CVD graphene films transferred onto premium quartz substrates, ideal for advanced optical and electronic applications. Our process begins with graphene growth on optimized metal substrates using surface catalysis mechanisms, followed by precise transfer onto circular quartz substrates. This combination provides exceptional optical clarity and thermal stability for demanding research and industrial applications.

Specifications

  • Substrate: Fused quartz (circular, Ø2.5cm × 3mm thickness)

  • Graphene Area: 1cm × 1cm

  • Layer Options: Single, Double, 3-5, 6-8 layers

  • Quality Verification: Raman characterization performed on reference silicon oxide substrates

Key Features

  • Optical Excellence: Superior transparency with minimal light scattering

  • Thermal Stability: Maintains performance under high-temperature conditions

  • Electrical Performance: High carrier mobility with low sheet resistance

  • Chemical Inertness: Excellent resistance to environmental degradation

  • Surface Quality: Atomically smooth surface for precise applications

Applications

  • High-performance transparent electrodes

  • Advanced optical devices and sensors

  • UV and visible light photonics

  • High-temperature electronic devices

  • Precision measurement instruments

Technical Advantages

  • Ready-to-use optical quality substrate

  • Excellent thermal expansion matching

  • Low autofluorescence background

  • Suitable for harsh environment applications

  • Compatible with standard cleanroom processes

Contact Information
For technical specifications and ordering:
Email: sales@maxnanotech.com

Weight 100 g
Dimensions 30 × 20 × 20 mm
Specification

Layers: Single-layer; Area: 1 cm × 1 cm, Layers: Double-layer; Area: 1 cm × 1 cm, Layers: 3–5 layers; Area: 1 cm × 1 cm, Layers: 6–8 layers; Area: 1 cm × 1 cm

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