Micro-nano Fabrication Services
Providing advanced micro- and nano-scale fabrication and manufacturing services to support your micro-device and chip-level R&D.
Service Summary
- With our full-service fabrication platform and cleanroom, we offer small-batch, multi-product micro-nano fabrication for universities, research centers, and companies.
- We support both cutting-edge research and rapid prototyping.
Core Fabrication Capabilities
Lithography
Ultra-high resolution patterning (down to 10nm).
UV Lithography:
Fast, large-area patterning
for micron-level resolution.
Thin Film Deposition
E-beam Evaporation: For metal films (Au, Cr, Al, Ti, etc.).
Sputtering: For dense, uniform films of metals, alloys, and oxides.<br
Atomic Layer Deposition (ALD): For ultra-thin, conformal nanofilms.
Etching
Reactive Ion Etching (RIE):
Dry etching for materials like
SiO₂, Si, SiN.
Ion Beam Etching (IBE):
High-precision etching for a
variety of materials.
Other Specialized Services
Focused Ion Beam (FIB):
Nanoscale fabrication, TEM sample prep, and circuit repair.
Nanoimprint Lithography (NIL):
Large-area, low-cost nanostructure fabrication.
Our Process
1.Consultation Share your design files (like GDSII) and needs.
2.Proposal Our engineers will assess your request and provide a detailed plan and quote.
3.Material Check We inspect your provided substrates.
4.Fabrication We complete the work in our cleanroom.
5.Quality Check We use tools like microscopes and SEM to inspect the results.
6.Delivery We deliver the finished samples and an inspection report.