Product Overview
We produce large-area CVD graphene on high-purity copper foil substrates through precisely controlled growth conditions. Utilizing copper’s excellent surface catalytic properties, our manufacturing process enables uniform graphene formation across substantial surface areas, making it ideal for both research applications and industrial-scale production.
Specifications
-
Substrate: High-purity copper foil (~25μm thickness)
-
Graphene Area: 30cm × 20cm (large format)
-
Layer Options: Single, Double, 3-5, 6-8 layers
-
Quality Control: Batch consistency verification through Raman spectroscopy
Key Features
-
Large-Area Uniformity: Consistent quality across entire surface
-
Excellent Crystallinity: High-purity graphene with defined crystal structure
-
Superior Electrical Properties: High carrier mobility with low sheet resistance
-
Mechanical Flexibility: Maintains integrity under processing conditions
-
Chemical Stability: Reliable performance in ambient environments
Applications
-
Large-format electronic device fabrication
-
Transparent conductive electrodes for displays
-
Sensor arrays and detection systems
-
Energy storage and conversion devices
-
Composite material enhancement
Technical Advantages
-
Ready for transfer to various substrates
-
Suitable for roll-to-roll processing
-
Compatible with standard semiconductor protocols
-
Scalable for industrial applications
Contact Information
For technical specifications and volume pricing:
Email: Sales@maxnanotech.com





Reviews
There are no reviews yet.